BlitzLab offers the following systems, which can be provided to interested users:
RTP 1200
- Manufacturer:
- Von Ardenne GmbH
- Substrate sizes: up to 1200 x 1200 mm
- Transportation speed: up to 1 m/min
- Annealing gases: atmosphere
- Flash mode:
- lamp field o
300 x 1700 mm - single pulse
- lamp field o
- Pulse times: ~ 0.6 ms
- Energy density: up to 13 Jcm-2
FLA01
- Manufacturer:
- in-house development (flash division)
- Rovak GmbH (energy storage system)
- Substrate sizes: diameter up to 100 mm
- Annealing gases: nitrogen, argon, oxygen
- Flash mode:
- lamp field
- single pulse
- Pulse times: 0.65 – 20 ms
- Preheating: up to 600°C
- Energy density: up to 170 Jcm-2
Sputter FLA
- Manufacturer: Rovak GmbH
- Substrate sizes: up to 300 x 200 mm2
- Annealing gases: vacuum, nitrogen, argon, oxygen
- Flash mode:
- single lamp
- single pulse
- multi-flash up to 5 Hz
- Pulse times: 0.3 – 3 ms
- Energy density: up to 30 Jcm-2
Flasch Cube
- Manufacturer:
- in-house development (flash division)
- Rovak GmbH (energy storage system)
- Substrate sizes: up to 150 mm
- Annealing gases: nitrogen, argon, oxygen
- Flash modes:
- lamp field
- single pulse
- Pulse times: 0.65 – 20 ms
- Energy density: up to 160 Jcm-2
Laser annealing: COMPexPRO 201
- Manufacturer: Coherent
- Wave length: 308 nm, pulsed (10 Hz)
- Max. Power per pulse: 500 mJ
R2R coil coating
(TU Bergakademie Freiberg)
- Manufacturer: ROVAK GmbH
- Modules:
- 1x plasma cleaning
- 2x Sputtern
- 1x EB‑PVD
- 3x FLA
- 1x IR-Tempering
- Rolls: foil p to 180 mm width and 10 – 100 µm thickness
- Gas: argon, nitrogen, oxygen
- Flash modes:
- single lamps
- single pulse
- Multi‑Flash up to 10 Hz
- Pulse times: 0,3 to 10 ms
- Energy density: up to > 40 J/cm²
For more informationen please click here.
