BlitzLab offers the following systems, which can be provided to interested users.
Virtual Labtour
Here you have the opportunity to take a virtual Labtour.
Click here or on the Button to start the tour.
R2R Inkjet and FLA
- Manufacturer: Rovak GmbH
- Modules:
- 1x glovebox workspace
- 1x plasma cleaning
- 1x inkjet
- 2x FLA (Flash Lamp Annealing)
- 1x IR (Infrared) annealing
- Operating modes: sheet-to-sheet (S2S), roll-to-roll (R2R)
- Substrate size S2S: up to 300 x 200 mm2
- Parameters R2R:
- roll width: 180 mm
- film thickness (metal): 10 – 40 µm
- film thickness (plastic): 10 – 150 µm
- Flash mode:
- single lamp
- single pulse and multi-flash up to 10 Hz
- Gas: Argon, Atmosphere
- Inkjet: Fujifilm Dimatix SAMBA G3 (compatible with FUJIFILM DMP-2850)
RTP 1200
(Location: ZeHS, TU Bergakademie Freiberg)
- Manufacturer: Von Ardenne GmbH
- Substrate size: up to 1200 mm x 1200 mm
- Transportation speed: up to 1 m/min
- Annealing gas: atmosphere
- Flash mode:
- lamp field 300 x 1700 mm
- single pulse
- Pulse duration: ~ 0.6 ms
- Energy density: up to 13 Jcm-2
FLA01
- Manufacturer:
- in-house development (flash division)
- Rovak GmbH (energy storage system)
- Substrate size: up to 100 mm in diameter
- Annealing gases: nitrogen, argon, oxygen, forming gas
- Flash mode:
- lamp field
- single pulse
- combined pulse
- Pulse times: 0.65 – 20 ms
- Preheating: up to 700°C
- Energy density: up to 200 Jcm-2
Sputter FLA
- Manufacturer: Rovak GmbH
- Substrate size: up to 300 x 200 mm2
- Annealing environment: vacuum, nitrogen, argon, oxygen
- Flash mode:
- single lamp
- single pulse
- multi-flash up to 10 Hz
- Pulse duration: 0.33 – 3 ms
- Energy density: up to 30 Jcm-2 per pulse
Flash Cube
- Manufacturer:
- in-house development (flash division)
- Rovak GmbH (energy storage system)
- Substrate size: up to 150 mm
- Annealing environment: nitrogen, argon, oxygen, forming gas, vacuum
- Flash modes:
- lamp field
- single pulse
- combined pulse
- Pulse duration: 0.65 – 20 ms
- Energy density: up to 160 Jcm-2
Laser annealing: COMPexPRO 201
- Manufacturer: Coherent
- Wave length: 308 nm
- Max. energy per pulse: 500 mJ
- Pulse duration: 30 ns, 10 Hz
- R2R coil coating
(TU Bergakademie Freiberg)
- Manufacturer: ROVAK GmbH
- Modules:
- 1x plasma cleaning
- 2x sputter deposition
- 1x EB‑PVD
- 3x FLA
- 1x IR-Tempering
- Parameters R2R:
- foil width: up to 180 mm
- foil thickness: 10 – 100 µm
- Gas: argon, nitrogen, oxygen
- Flash modes:
- single lamp
- single pulse
- multi‑flash up to 10 Hz
- Pulse duration: 0,3 to 10 ms
- Energy density: > 40 J/cm² per pulse
For more informationen please click here.
Inkjetprinter DMP-2850
- Manufacturer: FULIFILM Dimatrix
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Movable xyz-table
-
Printable area ~ A4 format
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Substrate thickness < 0.5 – 25 mm
-
Repeatability: ± 25 μm
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Min. drop size ~ 30 µm (native drop volume 2.4 pL)
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Inks: metal, semiconductor, ceramics, biopolymers, etc.
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Printing head substrate heating: up to 60°C
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Cost-effective, piezo-based inkjet printer cartridges
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Ink capacity: 1.5 ml
Glovebox
- Manufacturer: GS Systemtechnik GmbH
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For the assembly of Lithium- Ion- Battery cells
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Argon atmosphere: Oxygen and water < 0.5 ppm
- For two Working places
Virtual Labtour
Here you have the opportunity to take a virtual Labtour.
Click here or on the Button to start the tour.
