BlitzLab offers the following systems, which can be provided to interested users:

FLA01

  • Manufacturer:
    • in-house development (flash division)
    • Rovak GmbH (energy storage system)
  • Substrate sizes: diameter up to 100 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash mode:
    • lamp field
    • single pulse
  • Pulse times: 0.65 – 20 ms
  • Preheating: up to 600°C
  • Energy density: up to 170 Jcm-2
Picture of FLA01
©HZDR

Sputter FLA

  • Manufacturer: Rovak GmbH
  • Substrate sizes: up to 300 x 200 mm2
  • Annealing gases: vacuum, nitrogen, argon, oxygen
  • Flash mode:
    • single lamp
    • single pulse
    • multi-flash up to 5 Hz
  • Pulse times: 0.3 – 3 ms
  • Energy density: up to 30 Jcm-2
Picture of Sputter FLA
©HZDR

Darkbox

  • Manufacturer:
    • in-house development (flash division)
    • Rovak GmbH (energy storage system)
  • Substrate sizes: up to 150 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash modes:
    • lamp field
    • single pulse
  • Pulse times: 0.65 – 20 ms
  • Energy density: up to 160 Jcm-2

Laser annealing: COMPexPRO 201

  • Manufacturer: Coherent
  • Wave length: 308 nm, pulsed (10 Hz)
  • Max. Power per pulse: 500 mJ
Picture of COMPexPRO 201
©HZDR

R2R coil coating

(TU Bergakademie Freiberg)

  • Manufacturer: ROVAK GmbH
  • Modules:
    • 1x plasma cleaning
    • 2x Sputtern
    • 1x EB‑PVD
    • 3x FLA
    • 1x IR-Tempering
  • Rolls: foil p to 180 mm width and 10 – 100 µm thickness
  • Gas: argon, nitrogen, oxygen
  • Flash modes:
    • single lamps
    • single pulse
    • Multi‑Flash up to 10 Hz
  • Pulse times: 0,3 to 10 ms
  • Energy density: up to > 40 J/cm²

For more informationen please click here.

R2R-Beschichtungsanlage ZeHS / TUBAF IEP. ©HZDR