FLA01

Picture of FLA01
Blitzlab’s FLA01 © HZDR / L. Rebohle
  • Manufacturer: in-house development
  • Substrate sizes: diameter up to 100 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash mode: lamp field, single pulse
  • Pulse times: 0.13 – 80 ms
  • Preheating: up to 800°C
  • Energy density: up to 135 Jcm-2
 

FLA200

  • Manufacturer: FHR Anlagenbau GmbH
  • Substrate sizes: 200 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash mode: lamp field, single pulse
  • Pulse times: 1 ms
  • Preheating: 800 °C
  • Energy density: up to 25 J/cm-2
Picture of Blitzlab's FLA200
Blitzlab’s FLA200 © HZDR / L. Rebohle
 

Sputter FLA

Picture of Sputter FLA
Blitzlab’s Sputter FLA© HZDR / L. Rebohle
  • Manufacturer: Rovak GmbH
  • Substrate sizes: up to 300 x 200 mm2
  • Annealing gases: vacuum, nitrogen, argon, oxygen
  • Flash mode: single lamp, single pulse, multi-flash up to 5 Hz
  • Pulse times: 0.13 – 20 ms
  • Energy density: up to 100 Jcm-2
 

Laser Annealing: Activationline 12

  • Manufacturer: LIMO
  • Substrate sizes: up to 300 x 200 mm2
  • Wave length: 808 nm, CW
  • Max. Power: 450 W
Picture of Activationline12
Laserausheilung: Activationline 12 © HZDR / L. Rebohle
 

Laser Annealing: COMPexPRO 201

Picture of COMPexPRO 201
Laserausheilung: COMPexPRO 201 © HZDR / L. Rebohle
  • Manufacturer: Coherent
  • Wave length: 308 nm, pulsed (10 Hz)
  • Max. Power per pulse: 500 mJ
  • Pulse duration: 30 ns