BlitzLab offers the following systems, which can be provided to interested users:

R2R Inkjet and FLA

  • Manufacturer: Rovak GmbH
  • Modules:
    • 1x Glovebox workspace
    • 1x Plasma cleaning
    • 1x Inkjet
    • 2x FLA (Flash Lamp Annealing)
    • 1x IR (Infrared) annealing
  • Operating modes: sheet-to-sheet (S2S), roll-to-roll (R2R)
  • Substrate sizes S2S: up to 300 x 200 mm2
  • Parameters R2R:
    • Roll width: 180 mm
    • Film thickness (metal): 10 – 40 µm
    • Film thickness (plastic): 10 – 150 µm
  • Flash mode:
    • Single lamps
    • Single pulse and multi-flash
  • Gas: Argon
  • Inkjet: Fujifilm Dimatix SAMBA G3 (compatible with FUJIFILM DMP-2850)
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RTP 1200

(Location: ZeHS, TU Bergakademie Freiberg)

  • Manufacturer: Von Ardenne GmbH
  • Substrate sizes: up to 1200 mm x 1200 mm
  • Transportation speed: up to 1 m/min
  • Annealing gases: atmosphere
  • Flash mode:
    • lamp field 300 x 1700 mm
    • single pulse
  • Pulse times: ~ 0.6 ms
  • Energy density: up to 13 Jcm-2
RTP 1200, von Ardenne, Blitzanlage
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FLA01

  • Manufacturer:
    • in-house development (flash division)
    • Rovak GmbH (energy storage system)
  • Substrate sizes: diameter up to 100 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash mode:
    • lamp field
    • single pulse
  • Pulse times: 0.65 – 20 ms
  • Preheating: up to 600°C
  • Energy density: up to 170 Jcm-2

     

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Sputter FLA

  • Manufacturer: Rovak GmbH
  • Substrate sizes: up to 300 x 200 mm2
  • Annealing gases: vacuum, nitrogen, argon, oxygen
  • Flash mode:
    • single lamp
    • single pulse
    • multi-flash up to 5 Hz
  • Pulse times: 0.3 – 3 ms
  • Energy density: up to 30 Jcm-2

     

Picture of Sputter FLA
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Flash Cube

  • Manufacturer:
    • in-house development (flash division)
    • Rovak GmbH (energy storage system)
  • Substrate sizes: up to 150 mm
  • Annealing gases: nitrogen, argon, oxygen
  • Flash modes:
    • lamp field
    • single pulse
  • Pulse times: 0.65 – 20 ms
  • Energy density: up to 160 Jcm-2

     

Laser annealing: COMPexPRO 201

  • Manufacturer: Coherent
  • Wave length: 308 nm, pulsed (10 Hz)
  • Max. Power per pulse: 500 mJ
  • Pulse duration: 30 ns
Picture of COMPexPRO 201
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R2R coil coating

(TU Bergakademie Freiberg)

  • Manufacturer: ROVAK GmbH
  • Modules:
    • 1x plasma cleaning
    • 2x Sputtern
    • 1x EB‑PVD
    • 3x FLA
    • 1x IR-Tempering
  • Rolls: foil p to 180 mm width and 10 – 100 µm thickness
  • Gas: argon, nitrogen, oxygen
  • Flash modes:
    • single lamps
    • single pulse
    • Multi‑Flash up to 10 Hz
  • Pulse times: 0,3 to 10 ms
  • Energy density: up to > 40 J/cm²

For more informationen please click here.

FUJIFILM Dimatix Materials Inkjetprinter – DMP-2850

  • variably movable xyz table

  • Printable area ~ A4 format with variable substrate thicknesses in the range < 0.5 – 25 mm thickness

  • Repeatability: ± 25 μm, minimum drop size ~ 30 µm (native drop volume 2.4 pL)

  • Capability of separating a wide variety of fluids/inks: e.g. metal-precious metal inks, inks containing semiconductor ceramics, biopolymers, etc.

  • Possibility of printing head substrate heating up to 60°C

  • Cost-effective, piezo-based inkjet printer cartridges, ink capacity: 1.5 ml

Tischdrucker, Tabletop-printer
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