Literature

Books

 
    [1] L. Rebohle, S. Prucnal, D. Reichel. Flash Lamp Annealing – from Basics to Application, 1st ed., Springer Cham, Switzerland, 2019
    [2] W. Skorupa, H. Schmidt (Eds.): Subsecond annealing of advanced materials, Springer Cham, Switzerland, 2014
© Springer

Journal articles

    • [1] L. Rebohle, S. Prucnal, W. Skorupa, A review of thermal processing in the subsecond range: semiconductors and beyond, Semicond. Sci. Technol. 31 (2016) 103001

      [2] S. Prucnal, L. Rebohle, W. Skorupa, Doping by flash lamp annealing, Mat. Sci. Semicon. Processing 62 (2017) 115

      [3] W. Skorupa, T. Schumann, R. Rebohle, Millisecond thermal processing using flash lamps for the advancement of thin layers and functional coatings, Surface & Coatings Technology 314 (2017) 169

      [4] S. Prucnal, J. Frigerio, E. Napolitani, et al., In situ ohmic contact formation for n-type Ge via non-equilibrium processing. Semicond. Sci. Technol. (2017), 32, 1–7.

      [5] L. Rebohle, M. Neubert, T. Schumann, W. Skorupa, Determination of the thermal cycle during flash lamp annealing without a direct temperature measurement, Int. J. Heat Mass Transf. 126 (2018) 1

      [6] V. Begeza, E. Mehner, H. Stöcker, et al., Formation of thin NiGe films by magnetron sputtering and flash lamp annealing, Nanomaterials 10 (2020) 648.

      [7] V. Begeza, L. Rebohle, H. Stöcker, E. Mehner, R. Hübner, S. Zhou, Formation and specific contact resistivity of NiGe on polycrystalline Ge made by flash lamp annealing, J. Alloys & Compounds 990 (2024) 174420

      [8] C. Cherkouk, M. Ferch, R. Hahn et al., Prelithiation of silicon thin film anodes using ion implantation for lithium ion batteries, Electrochem. Comm. 182 (2026) 108089